He is developing next-generation, nanoscale transistors for integrated electronics
The new electron beam writer housed in the Nano3 cleanroom facility at the Qualcomm Institute is important for electrical engineering professor Shadi Dayeh’s two major areas of research. He is developing next-generation, nanoscale transistors for integrated electronics; and he is developing neural probes that have the capacity to extract electrical signals from individual brain cells and transmit the information to a prosthetic device or computer. Achieving this level of signal extraction or manipulation requires tiny sensors spaced very closely together for the highest resolution and signal acquisition. Enter the new electron beam writer.
Electron beam (e-beam) lithography enables researchers to write very small patterns on large substrates with a high level of precision. It is a widely used tool in information technology and life science. Applications range from writing patterns on silicon and compound semiconductor chips for electronic device and materials research to genome sequencing platforms. But the ability to write patterns on the scale afforded by the Nano3 facility—with its minimum feature size of less than 8 nanometers on wafers with diameters that can be as large as 8 inches—is unique in Southern California. Before the facility opened earlier this year, the closest comparable e-beam writer was in Los Angeles. In an e-beam writer, unique patterns are “written” on a silicon wafer coated with a polymer resist layer that is sensitive to electron irradiation. The machine directs a narrowly focused electron beam onto the surface marking the pattern, making parts of the resist coating insoluble and others soluble. The soluble area is later washed away, revealing the pattern which can have sub-10 nanometer feature dimensions.
Bioengineering professor Todd Coleman will use the new e-beam writer as one essential step in the building of his epidermal, or tattoo, electronic devices. The devices are designed to acquire brain signals for a variety of medical applications, from monitoring infants for seizures in neonatal intensive care to studying the cognitive impairment associated with Alzheimer’s disease or dementia, and soldiers struggling with post-traumatic stress syndrome.
Electrical engineering Ph.D. candidate Andrew Grieco is using the machine to develop a new type of optical waveguide that promises to improve efficiency and reduce power consumption. Grieco works in the laboratory of Shaya Fainman, professor and chair, Department of Electrical and Computer Engineering. Developing on-chip optical networking devices such as waveguides, switches and amplifiers is a critical step in the development of optical chips. Although information systems rely primarily on fiber-optic networks to connect and share data around the world, the underlying computer technology is still based on ele ctronic chips, causing data traffic jams.
The Latest on: Electron Beam Writer
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- New Multibeam patent enhances highly-localized precision material removal on January 10, 2018 at 9:25 am
Complementary E-Beam Lithography (CEBL) to reduce litho cost; Direct Electron Writing (DEW) to enhance device security; Direct Deposition/Etch (DDE) for highly localized precision etch and deposition using directed electron activation; and E-Beam ... […]
- EUV Lithography Finally Ready for Chip Manufacturing on January 8, 2018 at 6:50 am
“People adopting EUV are defining its use, so that these things don’t get in the way,” says Aki Fujimura, CEO of electron-beam technology firm D2S and an expert in the technology used to write patterns on photomasks. Technology experts expect that ... […]
- e-Shuttle Now Delivering 65nm Logic ICs Manufactured Using Electron-Beam Direct Write (EBDW) Technology on December 21, 2017 at 2:03 am
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- Writing with the electron beam: Now in silver on July 24, 2017 at 3:32 pm
For the first time an international team realized direct writing of silver nanostructures using an electron beam applied to a substrate. Silver nanostructures have the potential to concentrate visible light at the nanoscale. Potential applications include ... […]
- Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography on August 11, 2014 at 5:00 pm
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- Advantest Develops EB Lithography System for 1Xnm Node on November 14, 2012 at 8:57 am
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- JEOL : Electron Beam Lithography (EBL) System Attachment for a JEOL 7800F FESEM on August 19, 2001 at 5:00 pm
Pattern generating hardware with a minimum of 12 MHz pattern writing speed * A minimum of 16-bit DACs for mainfield electron beam control * Direct connection and interface with a JEOL 7800F FE-SEM with all connecting cables and/or adapters included. […]
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